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UV Treatment Solutions for Microelectronics
Aquafine recognizes the challenges faced by water systems professionals in the design and construction of a water system for microelectronics production. Aquafine UV systems commonly perform three functions in producing pure water - microbial disinfection, TOC (Total Oxidizable Carbon) reduction, and ozone destruction. Being well versed in how all components of a pure water system interrelate, ensures optimum performance.
Models available for this application:
While UV is only part of the system, the experienced and professional Aquafine staff can be called upon to provide assistance related to complete system design. These systems are now available with standard High Efficiency (HE) electronic packages. These systems also come in skid-mounted design.
In ultrapure systems, a new trend is the use of UV in combination with ozone to provide an enhanced synergistic approach toward the reduction of trace organics.
Aquafine disinfection units address microbial contamination in the system by utilizing UV's 254 nm energy. This process destroys the DNA which prevents microbial proliferation. Particular care must be given toward minimizing dead-legs and maintaining acceptable velocities within the distribution system. Depending on water treatment requirements or system design, point-of-use UV equipment for wet hoods located within the Fab areas may also be considered.
Organics are among the most difficult contaminants to control in a pure water system. As critical dimensions for integrated circuits continue to decrease and transistor capacities continue to increase, contaminants in the parts per trillion range can produce yield-impacting defects. Organics are polar and weakly ionize in ultrapure water. This poses a considerable challenge to ion exchange resins. To prevent TOC leakage from polishing deionizers, silica and/or boron levels are typically monitored to determine when regenerations should be performed.
Aquafine TOC reduction units complement the organic scavenger resins of the polishing loop by oxidizing trace organics into free radicals (R -OH-) and carbon dioxide, which are more readily removed by ion exchange resins and/or degasifies. Should continuous ozone be a process requirement, Aquafine UV systems can be used to protect both product and costly microelectronic manufacturing equipment by the dissociation of ozone into dissolved oxygen. If dissolved oxygen (DO) is a concern, Aquafine engineers can provide assistance toward reducing or eliminating DO as well. For these reasons, more manufacturers around the world trust Aquafine for UV application assistance and support.
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